Nanonex Corporation, founded in 1999 and based in Monmouth Junction, New Jersey, is a privately held company that provides 100 clients worldwide with nanoimprint lithography (NIL) tools and services. The company's NIL products optimize nanopatterning manufacturing processes. Nanostructures can have sub-5nm resolutions. The firm's technology support high-throughput processing, reducing operating costs. Patented NIL machines allow manufacturers to produce uniform, precisely aligned nanoscale wafers. The machines handle thermal and photo-curable NIL and direct nanoimprinting operations. Nanonex provides customers with tools, resists, and masks. It offers manufacturers thermoplastic, thermal curable, photo-curable, and underlayer resists, along with mold materials, nanoimprint surfactants, 1D and 2D patterned NIL masks. The company is known for its Air Cushion Press (TM) nanoimprinting technology, which is employed in all of the firm's machines. Nanonex offers clients NIL process recipes and support services. The firm markets its technology to customers across the commercial and education sectors. Nanonex won a $2.9 million National Institute of Standards and Technology (NIST) Advanced Technology Program (ATP) award in 2007. The ATP grant supports development of the firm's Laser-Assisted Direct Imprint (LADI) nanopatterning and wafer planarization technology. Nanonex was founded by Dr. Stephen Y. Chou. The firm's NIL systems and processes result from research conducted by Dr. Chou at Princeton University.